Research areas	Thin film processing, Electronic materials and devices, Plasma chemistry, Molecular spectroscopy
Keywords	Plasma processing, Oxide electronics, Resistance random access memory, Transparent conducting film, Dielectric barrier discharge
Themes	(1) Thin film deposition for electronic materials and devices (2) Plasma chemistry in materials synthesis
Major publications	(1) Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering S. Kitagawa and T. Nakamura, Journal of Vacuum Science & Technology A, 43(2), 023409-1-11 (2025). (2) Carrier concentration dependence of optical and magnetic properties in epitaxial manganese-doped indium tin oxide films with different manganese concentrations S. Kitagawa and T. Nakamura, Current Applied Physics, 69, 60-69 (2025). (3) Anomalous Carrier Enhancement with Lightly Mn Doping in Indium–Tin Oxide Thin Films Studied by Hard X-ray Photoemission Spectroscopy N. Tsutsumi, D. Ootsuki, T. Ishida, T. Yoshida, Y. Takeda, A. Yasui, S. Kitagawa, and T. Nakamura Journal of the Physical Society of Japan, 93, 104801-1-6 (2024). (4) Sputter epitaxy and characterization of manganese-doped indium tin oxide films with different crystallographic orientations S. Kitagawa and T. Nakamura Journal of Applied Physics, 134(16), 165302-1-11 (2023). (5) Effect of Mn substitution on the electronic structure for Mn-doped indium-tin oxide films studied by soft and hard x-ray photoemission spectroscopy D. Ootsuki, T. Ishida, N. Tsutsumi,M. Kobayashi, K. Inagaki, T. Yoshida, Y. Takeda, S. Fujimori, A. Yasui, S. Kitagawa, and T. Nakamura Physical Review Materials, 7(12), 124601-1-6 (2023). (6) Oxidation processes of NO for production of reactive nitrogen species in plasma activated water K. Tachibana, J. -S. Oh, and T. Nakamura Journal of Physics D: Applied Physics, 53(38), 385202-1-14 (2020). (7) Comparative study of discharge schemes for production rates and ratios of reactive oxygen and nitrogen species in plasma activated water K. Tachibana and T. Nakamura Journal of Physics D: Applied Physics, 52(38), 385202-1-17 (2019). (8) Local structure analysis of magnetic transparent conducting films by x-ray spectroscopy T. Nakamura Journal of Physics D: Applied Physics, 49(4), 045005-1-5 (2016). (9) Isotopic study on metalorganic chemical vapor deposition of manganite films T. Nakamura Surface & Coatings Technology, 230, 213-218 (2013). (10) Thin film deposition of metal oxides in resistance switching devices: electrode material dependence of resistance switching in manganite films T. Nakamura, K. Homma, and K. Tachibana Nanoscale Research Letters, 8(1), 76-1-7 (2013).
Professional societies/Research and synergic activities
Teaching Areas	Undergraduate courses Graduate courses (Master's program) Graduate courses (Doctor's program) Undergraduate courses open to all departments
Background

Send message to Professor NAKAMURA, Toshihiro by mail