NAKAMURA, Toshihiro Professor
| Graduate School | Human and Environmental Studies/Materials Science |
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| Undergraduate School | |
| Other Affiliation | Institute for Liberal Arts and Sciences |
| nakamura.toshihiro.5m(_at_)kyoto-u.ac.jp (Replace (_at_) with @.) | |
| Personal Page |
| Research areas | Thin film processing, Electronic materials and devices, Plasma chemistry, Molecular spectroscopy |
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| Keywords | Plasma processing, Oxide electronics, Resistance random access memory, Transparent conducting film, Dielectric barrier discharge |
| Themes | (1) Thin film deposition for electronic materials and devices (2) Plasma chemistry in materials synthesis |
| Major publications | (1) Sputter epitaxy and characterization of manganese-doped indium tin oxide films with different crystallographic orientations S. Kitagawa and T. Nakamura Journal of Applied Physics, 134(16), 165302-1-11 (2023). (2) Effect of Mn substitution on the electronic structure for Mn-doped indium-tin oxide films studied by soft and hard x-ray photoemission spectroscopy D. Ootsuki, T. Ishida, N. Tsutsumi,M. Kobayashi, K. Inagaki, T. Yoshida, Y. Takeda, S. Fujimori, A. Yasui, S. Kitagawa, and T. Nakamura Physical Review Materials, 7(12), 124601-1-6 (2023). (3) Oxidation processes of NO for production of reactive nitrogen species in plasma activated water K. Tachibana, J. -S. Oh, and T. Nakamura Journal of Physics D: Applied Physics, 53(38), 385202-1-14 (2020). (4) Examination of UV-absorption spectroscopy for analysis of O3, NO2-, and HNO2 compositions and kinetics in plasma-activated water K. Tachibana and T. Nakamura Japanese Journal of Applied Physics, 59(5), 056004-1-7 (2020). (5) Comparative study of discharge schemes for production rates and ratios of reactive oxygen and nitrogen species in plasma activated water K. Tachibana and T. Nakamura Journal of Physics D: Applied Physics, 52(38), 385202-1-17 (2019). (6) Characterization of dielectric barrier discharges with water in correlation to productions of OH and H2O2 in gas and liquid phases K. Tachibana and T. Nakamura Japanese Journal of Applied Physics, 58(4), 046001-1-11 (2019). (7) Local structure analysis of magnetic transparent conducting films by x-ray spectroscopy T. Nakamura Journal of Physics D: Applied Physics, 49(4), 045005-1-5 (2016). (8) Spectroscopic ellipsometry analysis of perovskite manganite films for resistance switching devices M. Yamada, O. Sakai, and T. Nakamura Thin Solid Films, 571, 597-600 (2014). (9) Isotopic study on metalorganic chemical vapor deposition of manganite films T. Nakamura Surface & Coatings Technology, 230, 213-218 (2013). (10) Thin film deposition of metal oxides in resistance switching devices: electrode material dependence of resistance switching in manganite films T. Nakamura, K. Homma, and K. Tachibana Nanoscale Research Letters, 8(1), 76-1-7 (2013). |
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